The effects of the ambient atmosphere in the annealing chamber on the electrical and structural characteristics of Zn-implanted m-V compound semiconductors, processed by low-power pulsed-laser annealing are presented. The samples were analyzed using several complementary experimental techniques: Reflection high-energy electron diffraction, Rutherford backscattering spectroscopy, Raman spectroscopy, secondary ion mass spectroscopy, and electrical measurements. During the laser beam irradiation in the presence of gas inlet into the annealing chamber the ambient gas atoms diffused well into the target changing the stoichiometry and the electrical parameters; Redistribution of the implanted impurity was also observed. By varying the type of gas used and its pressure, it was possible to achieve electrical activation of up to 80%. It seems all structure and electrical parameters achieve their best values at the same ambient atmosphere and density of the deposited laser power P, e.g., 1.5 atm of N-2 and P = 6.5 MW/cm(2) for InP. [S0163-1829(99)12803-0].
Structural reordering and electrical activation of ion-implanted GaAs and InP due to laser annealing in a controlled atmosphere / Vitali, G.; Pizzuto, C.; Zollo, G.; Karpuzov, D.; Kalitzova, M.; van der Heide, P.; Scamarcio, G.; Spagnolo, V.; Chiavarone, L.; Manno, D.. - In: PHYSICAL REVIEW AND PHYSICAL REVIEW LETTERS INDEX. - ISSN 0094-0003. - STAMPA. - 59:4(1999), pp. 2986-2994. [10.1103/PhysRevB.59.2986]
Structural reordering and electrical activation of ion-implanted GaAs and InP due to laser annealing in a controlled atmosphere
V. Spagnolo;
1999-01-01
Abstract
The effects of the ambient atmosphere in the annealing chamber on the electrical and structural characteristics of Zn-implanted m-V compound semiconductors, processed by low-power pulsed-laser annealing are presented. The samples were analyzed using several complementary experimental techniques: Reflection high-energy electron diffraction, Rutherford backscattering spectroscopy, Raman spectroscopy, secondary ion mass spectroscopy, and electrical measurements. During the laser beam irradiation in the presence of gas inlet into the annealing chamber the ambient gas atoms diffused well into the target changing the stoichiometry and the electrical parameters; Redistribution of the implanted impurity was also observed. By varying the type of gas used and its pressure, it was possible to achieve electrical activation of up to 80%. It seems all structure and electrical parameters achieve their best values at the same ambient atmosphere and density of the deposited laser power P, e.g., 1.5 atm of N-2 and P = 6.5 MW/cm(2) for InP. [S0163-1829(99)12803-0].I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
