Density of gap states distribution of amorphous silicon films has been investigated by means of photoconductivity measurements carried out as a function of the temperature.

Evaluation of density of states distribution in amorphous silicon films by photoconductivity measurements / Augelli, V.; Berardi, V.; Murri, R.; Schiavulli, L.. - In: JOURNAL OF NON-CRYSTALLINE SOLIDS. - ISSN 0022-3093. - STAMPA. - 90:1-3(1987), pp. 123-126. [10.1016/S0022-3093(87)80396-4]

Evaluation of density of states distribution in amorphous silicon films by photoconductivity measurements

Berardi, V.;
1987-01-01

Abstract

Density of gap states distribution of amorphous silicon films has been investigated by means of photoconductivity measurements carried out as a function of the temperature.
1987
Evaluation of density of states distribution in amorphous silicon films by photoconductivity measurements / Augelli, V.; Berardi, V.; Murri, R.; Schiavulli, L.. - In: JOURNAL OF NON-CRYSTALLINE SOLIDS. - ISSN 0022-3093. - STAMPA. - 90:1-3(1987), pp. 123-126. [10.1016/S0022-3093(87)80396-4]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11589/1138
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