In this paper we present preliminary experimental results of an improved dual grating-assisted directional coupler. As the top SiON layer is thicker, the total insertion loss is reduced, and coupling efficiency significantly increased in the Lband wavelength region, compared to the previously reported results. The coupling efficiency is in the 42-56% range for both C-and L-band wavelength regions. Temperature dependence of the coupler has been also investigated
Improved dual grating-assisted directional coupler for silicon nanophotonics / Mashanovich, G. Z.; Passaro, Vittorio; Ensell, G. J.; Gardes, F. Y.; Reed, G. T.. - (2006), pp. 272-274. (Intervento presentato al convegno 25th International Conference on Microelectronics, MIEL 2006 tenutosi a Belgrade, Serbia nel May 14-17, 2006) [10.1109/ICMEL.2006.1650949].
Improved dual grating-assisted directional coupler for silicon nanophotonics
PASSARO, Vittorio;
2006-01-01
Abstract
In this paper we present preliminary experimental results of an improved dual grating-assisted directional coupler. As the top SiON layer is thicker, the total insertion loss is reduced, and coupling efficiency significantly increased in the Lband wavelength region, compared to the previously reported results. The coupling efficiency is in the 42-56% range for both C-and L-band wavelength regions. Temperature dependence of the coupler has been also investigatedI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
