Third order grating filters fabricated in small Silicon-on-Insulator rib waveguides are demonstrated. Variations in grating etch depth and duty cycle are considered, and a maximum experimental reflection of 42% is demonstrated for gratings of 1500 mu m in length, with a grating period of approximately 689nm and an etch depth of 200nm. Agreement with modeling is shown to be good.
Third order Bragg grating filters in small SOI waveguides / Chan, S. P.; Passaro, V. M. N.; Mashanovich, G. Z.; Ensell, G.; Reed, G. T.. - In: JOURNAL OF THE EUROPEAN OPTICAL SOCIETY. RAPID PUBLICATIONS. - ISSN 1990-2573. - ELETTRONICO. - 2:(2007). [10.2971/jeos.2007.07029]
Third order Bragg grating filters in small SOI waveguides
Passaro, V. M. N.;
2007-01-01
Abstract
Third order grating filters fabricated in small Silicon-on-Insulator rib waveguides are demonstrated. Variations in grating etch depth and duty cycle are considered, and a maximum experimental reflection of 42% is demonstrated for gratings of 1500 mu m in length, with a grating period of approximately 689nm and an etch depth of 200nm. Agreement with modeling is shown to be good.| File | Dimensione | Formato | |
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