Recent studies on elementary processes relevant to H(2) plasmas are reviewed, emphasizing, in particular, vibrational state selected electron-molecule and heavy particle-molecule interactions. These data are then discussed in the framework of plasma kinetics for reactors of technological applications. Particular emphasis is given to microwave and parallel-plate RF discharges.
Elementary processes and kinetics of H2 plasmas for different technological applications / Capitelli, M; Celiberto, R; Esposito, F; Laricchiuta, A; Hassouni, K; Longo, S. - In: PLASMA SOURCES SCIENCE & TECHNOLOGY. - ISSN 0963-0252. - STAMPA. - 11:3A(2002), pp. A7-A25. [10.1088/0963-0252/11/3A/302]
Elementary processes and kinetics of H2 plasmas for different technological applications
Celiberto R;
2002-01-01
Abstract
Recent studies on elementary processes relevant to H(2) plasmas are reviewed, emphasizing, in particular, vibrational state selected electron-molecule and heavy particle-molecule interactions. These data are then discussed in the framework of plasma kinetics for reactors of technological applications. Particular emphasis is given to microwave and parallel-plate RF discharges.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
